GATE ECE · 2018 · EC
Question 20: Semiconductor memories
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Question 20
ECNAT1 markNeeds review
There are two photolithography systems: one with light source of wavelength
nm (System 1) and another with light source of wavelength
nm (System 2). Both photolithography systems are otherwise identical. If the minimum feature sizes that can be realized using System 1 and System 2 are
and
respectively, the ratio
(correct to two decimal places) is__________.Log in to check the answer
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2018EC
GATE ECE 2018 · Paper 1
Electronics and Communication Engineering · Original paper archive
- Section
- Electronics and Communication Engineering
- Question type
- Numerical answer (NAT)
- Marks
- 1 mark
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