Question 16

XE-CNAT2 marksNeeds review
Pure silicon (Si) has a band gap (Eg) of 1.1 eV. This Si is doped with 1 ppm (parts per million) of phosphor atoms. Si contains 5 × 10²⁸ atoms per m³ in pure form. At temperature T = 300 K, the shift in Fermi energy upon doping with respect to intrinsic Fermi level of pure Si will be ______ eV (with appropriate sign and round-off to two decimal places).
Intrinsic carrier concentration of Si, ni, is given as:

Given: Mass of an electron, m = 9.1 × 10⁻³¹ kg Charge of an electron, e = 1.6 × 10⁻¹⁹ C Boltzmann constant, kB = 1.38 × 10⁻²³ J.K⁻¹ Planck’s constant, h = 6.6 × 10⁻³⁴ J.s⁻¹

Log in to check the answer

You can attempt this question now. Sign in to view the answer key, explanations and discussion.Log in to check answer

EXPLORE & PRACTISE

Paper and topic context

See where this question comes from and choose what to practise next.

2020XE-C

GATE XE 2020 · Paper 1

Engineering Sciences · Original paper archive

Section
Section XE-C
Question type
Numerical answer (NAT)
Marks
2 marks

Practise related topics

Explore more previous year questions using this question’s imported topic tags.

engineering sciences

GATE XE previous year questions

engineering

GATE XE previous year questions

applied science

GATE XE previous year questions

properties applications materials

GATE XE previous year questions

Properties and Applications of Materials

GATE XE previous year questions

fermi energy

GATE XE previous year questions

Comments

Ask a question, share your approach, or help someone understand.

Log in to view the discussion

You’re not logged in. Log in or create an account to see discussions and add comments.